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  U.S. Foundry Flyer
(12/2006) (278 KB)
 
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UC-1H 0.35 µm CMOS (4Al)


Process Features

  • Twin Well CMOS
  • LOCOS Isolation
  • Gate Oxide 85 A
  • Gate: 0.36 µm (width) 0.78 µm (pitch)
  • Contact Diameter: 0.48 µm
  • 3 to 4 Al capability
  • 1 Al: 0.60 µm (width) 1.12 µm (pitch)
  • 2-3 Al: 0.72 µm (width) 1.32 µm (pitch)
  • 4 Al: 1.0 µm (width) 2.0 µm (pitch)

Device Features

  • Supply Voltage: 3.3 0.3 V (Normal Transistor)
  • Supply Voltage: 5.0 0.5 V (Multi Oxide Transistor)
  • Min. Transistor Width: 0.9 um
  • Min. Transistor Pitch: 1.36 um (Min. Gate Pitch w/ Contact)

CMOS Electrical Parameters

NMOS Device:
Target Min Max Units
BVDSN (50/0.36 @1µA Vgs = 0)
  7   V
Vtn (50/0.36 @ Ids=1µA & Vds=3.3V)
0.55 0.4 0.7 V
Ionn (50/0.36 @Vds=Vgs=3.3V)
22 19 26 mA
PMOS Device:
Target Min Max Units
BVDSP (Vgs = 0)
    -7 V
Vtp (50/0.36 @ Ids =-1.0 µA & Vds=-3.3V)
-0.6 -0.7 -0.45 V
Ionp (50/0.36 @Vds=Vgs=-3.3V)
-10.5 -13.5 -9 mA


Questions? Contact our foundry team.
 

 
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